Log in to see this item in other languages
Hollow Cathode Deposition of Thin Films
Thin films of metals and compounds have a very wide range of applications today. Many of the deposition methods used for the production of such films utilize plasma to support the growth the film, e.g. by the supply of energy and the enhancement of reactivity. This thesis focuses on the physical vapor deposition (PVD) of thin films by high density plasma sources based on hollow cathodes and aim…
Contributors
- Bárdoš Ladislav Docent
- Baránková Hana Docent
- Nender Claes Docent
- Uppsala universitet Teknisk-naturvetenskapliga vetenskapsområdet Tekniska sektionen Institutionen för teknikvetenskaper Fasta tillståndets elektronik
Creator
- Gustavsson Lars-Erik 1969- , Uppsala universitet, Fasta tillståndets elektronik
Publisher
- Acta Universitatis Upsaliensis
Date
- 2006
- 2006-06-07
- 2006-05-17
- 2006-05-17
- 2006-06-07
- 2006
Contributors
- Bárdoš Ladislav Docent
- Baránková Hana Docent
- Nender Claes Docent
- Uppsala universitet Teknisk-naturvetenskapliga vetenskapsområdet Tekniska sektionen Institutionen för teknikvetenskaper Fasta tillståndets elektronik
Creator
- Gustavsson Lars-Erik 1969- , Uppsala universitet, Fasta tillståndets elektronik
Publisher
- Acta Universitatis Upsaliensis
Date
- 2006
- 2006-06-07
- 2006-05-17
- 2006-05-17
- 2006-06-07
- 2006
Providing institution
Aggregator
Rights statement for the media in this item (unless otherwise specified)
- http://rightsstatements.org/vocab/InC/1.0/
- http://rightsstatements.org/vocab/InC/1.0/
Identifier
- oai:DiVA.org:uu-6925
Format
- electronic55
- electronic
- 55
Language
- en
Is part of
- http://data.theeuropeanlibrary.org/Collection/a1041
Relations
- Digital Comprehensive Summaries of Uppsala Dissertations from the Faculty of Science and Technology1651-6214194
Year
- 2006
Providing country
- Sweden
Collection name
First time published on Europeana
- 2014-09-07T10:21:00.175Z
Last time updated from providing institution
- 2014-09-07T10:21:00.175Z